Journals Articles Conferences News About CLP
Submit a paper Email Alert
Search
Search
Articles
Journals
News
Advanced Search
Top Searches
2D MaterialsTransformation opticsQuantum PhotonicsSmall lasersSemiconductor UV PhotonicsSupersymmetric microring laser arrays

Infrared and Laser Engineering, Volume. 48, Issue 11, 1105003(2019)

Design and preparation of grating for 808 nm semiconductor distributed feedback laser

Ban Xuefeng1,2、*, Zhao Yihao3, Wang Cuiluan1, Liu Suping1, and Ma Xiaoyu1,2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
    • show less
    AbstractGet PDF
    Figures&Tables (0)
    Equations (0)
    References (15)
    Tools
    Paper Information
    Topics
    Figures & Tables(0)
    Tools

    Get Citation

    Copy Citation Text

    Ban Xuefeng, Zhao Yihao, Wang Cuiluan, Liu Suping, Ma Xiaoyu. Design and preparation of grating for 808 nm semiconductor distributed feedback laser[J]. Infrared and Laser Engineering, 2019, 48(11): 1105003

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Set citation alerts for article
    Save article for my favorites
    Paper Information

    Category: 激光器与激光光学

    Received: Jul. 11, 2019

    Accepted: Aug. 21, 2019

    Published Online: Dec. 9, 2019

    The Author Email: Xuefeng Ban (banxuefeng@semi.ac.cn)

    DOI:10.3788/irla201948.1105003

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology