Infrared and Laser Engineering, Volume. 48, Issue 11, 1105003(2019)

Design and preparation of grating for 808 nm semiconductor distributed feedback laser

Ban Xuefeng1,2、*, Zhao Yihao3, Wang Cuiluan1, Liu Suping1, and Ma Xiaoyu1,2
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    Ban Xuefeng, Zhao Yihao, Wang Cuiluan, Liu Suping, Ma Xiaoyu. Design and preparation of grating for 808 nm semiconductor distributed feedback laser[J]. Infrared and Laser Engineering, 2019, 48(11): 1105003

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    Paper Information

    Category: 激光器与激光光学

    Received: Jul. 11, 2019

    Accepted: Aug. 21, 2019

    Published Online: Dec. 9, 2019

    The Author Email: Xuefeng Ban (banxuefeng@semi.ac.cn)

    DOI:10.3788/irla201948.1105003

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