An investigation on capabilities of polarization control for immersion lithography through simulation

[in Chinese]; [in Chinese]; [in Chinese]

Chinese Optics Letters, Volume. 3, Issue 0s, 198(2005)

[in Chinese]^1,2, [in Chinese]¹, and [in Chinese]¹

¹State Key Laboratory of Optical Technology for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209

²Graduate School of the Chinese Academy of Sciences, Beijing 100039

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References(9)

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[4] [4] J. A. Hoffnagle, W. D. Hinsberg, M. Sanchez, and F. A. Houle, J. Vac. Sci. Technol. B 17, 3306 (1999).

[5] [5] B. W. Smith and J. Cashmore, Proc. SPIE 4691, 11 (2002).

[6] [6] C. A. Mack, Proc. SPIE 5040, 151 (2003).

[7] [7] F. M. Schellenberg, Proc. SPIE 5377, 1 (2004).

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CLP Journals

[1] Zhou Yuan, Li Yanqiu. Optimization of Double Bottom Antireflective Coating for Hyper Numerical Aperture Lithography[J]. Acta Optica Sinica, 2008, 28(3): 472

[2] Zhou Yuan, Li Yanqiu. Optimization of Topside Antireflective Coatings for Hyper Numerical Aperture Lithography[J]. Acta Optica Sinica, 2008, 28(2): 337

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[in Chinese], [in Chinese], [in Chinese]. An investigation on capabilities of polarization control for immersion lithography through simulation[J]. Chinese Optics Letters, 2005, 3(0s): 198

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Published Online: Mar. 5, 2007

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Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology