Chinese Journal of Quantum Electronics, Volume. 17, Issue 1, 81(2000)

The Influence of Ablation of Film Materials by Laser onZ-scan Measurement

[in Chinese]1 and [in Chinese]2
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  • 1[in Chinese]
  • 2[in Chinese]
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    References(5)

    [1] [1] Sheik-Bahae M, Said A A, Wei T H et al. Sensitive measurement of optical nonlinearities using a single beam. IEEE. J. Quantum Electron, 1990, 26(4): 760~ 769

    [2] [2] Yang Lina, Dorsinville R, Wang Q Z et al. Excite-state nonlinearity in polythiophene thin films investigated by the Z-scan technique. Optics Letters, 1992, 17(5): 323~325

    [3] [3] Wang Q, Zhang Chungping. Optical limiting by chemically enhanced bacteriorhodopsin films. Optics Letters, 1993, 18(10): 775~777

    [4] [4] Michelotti F, Fazio E, Senesi F et al. Nonlinearity and photostructural changes in glassy As2S2 thin films. Optics Communications, 1998, 101(1): 74~78

    [5] [5] Patterson B M, White W R, Robbins T A et al. Linear optical effects in Z-scan measurements of thin films. Applied Optics, 1998, 37(10): 1854~1857

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    [in Chinese], [in Chinese]. The Influence of Ablation of Film Materials by Laser onZ-scan Measurement[J]. Chinese Journal of Quantum Electronics, 2000, 17(1): 81

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    Paper Information

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    Received: Feb. 2, 1999

    Accepted: --

    Published Online: May. 15, 2006

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