Acta Optica Sinica, Volume. 24, Issue 12, 1638(2004)
The Elimination of Thermal Runaway in 10.6 μm Laser-Induced Diffusion
[4] [4] Siregar M R T, Lüthy W, Affolter K. Dynamics of CO2 laser heating in the processing of silicon. Appl. Phys. Lett., 1980, 36(10): 787~788
[5] [5] Lax M. Temperature rise induced by a laser beam. J. Appl. Phys., 1977, 48(9): 3919~3924
[6] [6] Loze M K, Wright C D. Temperature distributions in semi-infinite and finite-thickness media as a result of absorption of laser light. Appl. Opt., 1997, 36(2): 494~507
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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. The Elimination of Thermal Runaway in 10.6 μm Laser-Induced Diffusion[J]. Acta Optica Sinica, 2004, 24(12): 1638