To implement low-cost mass production of large-area micro/nanostructures on large-size rigid and fragile substrates, this study presents a novel composite nanoimprint lithography technique. First, the basic principle and process of the composite imprint lithography are described. Then, the effects and rules of the key process parameters (i.e., spreading speed of the flexible mold, imprint force, imprint speed, and curing time) on the imprinted patterns are revealed by a series of experiments. Finally, through a combination of the home-made composite imprinter and optimized process parameters, four typical cases are illustrated. We fabricated large-area micro/nanostructures on three rigid substrates (glass, polymethyl methacrylate, and sapphire), including microscale columnar structures (the largest graphic area is 132 mm× 119 mm), a microscale grating structure (the largest area is 6-inch round), and a nanoscale columnar structure (the graphic area is 47 mm× 47 mm). Experimental results show that the presented composite imprint lithography technique provides a novel way for the macroscopic quantity preparation of large-area micro/nanostructures and large-area patterning on rigid or fragile substrates, thus presenting a bright prospect for industrial applications.