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Acta Optica Sinica, Volume. 32, Issue 12, 1211003(2012)

Study on the Off-Axis Illumination for Extreme Ultraviolet Lithography

Wang Jun1,2、*, Jin Chunshui1, Wang Liping1, and Lu Zengxiong1,2
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    Wang Jun, Jin Chunshui, Wang Liping, Lu Zengxiong. Study on the Off-Axis Illumination for Extreme Ultraviolet Lithography[J]. Acta Optica Sinica, 2012, 32(12): 1211003

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    Paper Information

    Category: Imaging Systems

    Received: Jun. 15, 2012

    Accepted: --

    Published Online: Oct. 25, 2012

    The Author Email: Jun Wang (wjciomp@gmail.com)

    DOI:10.3788/aos201232.1211003

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology