Acta Photonica Sinica, Volume. 32, Issue 10, 1228(2003)

Hall Ion Source for Thin-film Coatings

[in Chinese]1... [in Chinese]2, [in Chinese]1, [in Chinese]1, [in Chinese]1 and [in Chinese]1 |Show fewer author(s)
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    References(4)

    [1] [1] Anton R,Hagedorn H,Schnellbugel A. Ion-assisted deposition of high-quality, thorium free anti-reflection coatings for high-power CO2-lasers.SPIE, 1994,2114:288~296

    [3] [3] Willey R R.Some comparisons in the application of End-Hall and cold cathode ion sources in the conversion of SiO to SiO2.SPIE, 1994, 2262:14~20

    [4] [4] Fulton M L. Approaches explored for producing a variety of ion-assisted-deposited thin-film coatings using an end-Hall ion source.SPIE, 1996,2776: 114~125

    [5] [5] Fulton M L. Application of ion assisted deposition using a gridless end-Hall ion source for volume manufacturing of thin-film optical filters.SPIE, 1994,2253: 374~393

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Hall Ion Source for Thin-film Coatings[J]. Acta Photonica Sinica, 2003, 32(10): 1228

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    Paper Information

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    Received: Nov. 25, 2002

    Accepted: --

    Published Online: Sep. 17, 2007

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