Chinese Optics Letters, Volume. 11, Issue 5, 053002(2013)
Repetition rate dependence of absorption of fused silica irradiated at 193 nm
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Weijing Liu, Bincheng Li. Repetition rate dependence of absorption of fused silica irradiated at 193 nm[J]. Chinese Optics Letters, 2013, 11(5): 053002
Paper Information
Category: Spectroscopy
Received: Dec. 27, 2012
Accepted: Jan. 28, 2013
Published Online: Apr. 16, 2013
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