Chinese Optics Letters, Volume. 11, Issue 5, 053002(2013)

Repetition rate dependence of absorption of fused silica irradiated at 193 nm

Weijing Liu and Bincheng Li

Repetition rate-dependent absorbance measurements of synthetic fused silica at 193-nm irradiation are performed in the range of 50–1 000 Hz with an ArF laser calorimeter. The "apparent" single- and twophoton absorption coefficients are determined by measuring the laser fluence-dependent absorbance of fused silica samples with different thicknesses to separate the surface absorption and bulk absorption. The measurement results indicate a reversible nonlinear increase of both apparent single- and two-photon absorption coefficients with increasing repetition rate for the synthetic fused silica, whereas the surface absorption shows no dependence on the repetition rate.

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Weijing Liu, Bincheng Li. Repetition rate dependence of absorption of fused silica irradiated at 193 nm[J]. Chinese Optics Letters, 2013, 11(5): 053002

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Paper Information

Category: Spectroscopy

Received: Dec. 27, 2012

Accepted: Jan. 28, 2013

Published Online: Apr. 16, 2013

The Author Email:

DOI:10.3788/col201311.053002

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