Acta Optica Sinica, Volume. 22, Issue 3, 290(2002)

Refractive Indexes of Oxidized Thin Films Deposited by Ion Beam Sputtering

[in Chinese]*, [in Chinese], [in Chinese], [in Chinese], and [in Chinese]
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    References(3)

    [1] [1] Zoller R, Gotzelmann R, Matl K et al.. Temperature-stable bandpass filters deposited with plasma ion-assisted deposition. Appl. Opt., 1996, 35(28):5609~5612

    [2] [2] Takashashi H. Temperature stability of thin-film narrow-bandpass filters produced by ion-assisted deposition. Appl. Opt., 1995, 34(4):667~675

    [3] [3] Qi T, Daibu S, Kazuo K et al.. Fabrication and characteristics of DWDM filters deposited by IAD. Opt. Instrum., 1999, 21(4~5):74~80

    CLP Journals

    [1] Xue Hui, Shen Weidong, Gu Peifu, Luo Zhenyue, Liu Xu, Zhang Yueguang. Thickness Measurement of Thin Film Based on White-Light Spectral Interferometry[J]. Acta Optica Sinica, 2009, 29(7): 1877

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Refractive Indexes of Oxidized Thin Films Deposited by Ion Beam Sputtering[J]. Acta Optica Sinica, 2002, 22(3): 290

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    Paper Information

    Category: Thin Films

    Received: Apr. 4, 2001

    Accepted: --

    Published Online: Aug. 8, 2006

    The Author Email: (gupeifu@hotmail.com)

    DOI:

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