Cu/TaN multilayer films with different modulation periods were deposited on Si substrates by magnetron sputtering method. The film microstructure and surface morphology were investigated by X-ray diffraction (XRD) measurement and atomic force microscopy (AFM) respectively. The result shows that amorphous TaN sublayer and polycrystalline Cu sublayer were obtained. With increasing modulation period L, the texture coefficient T111 of Cu(111) plane decreases. The surface roughness Rrms of Cu/TaN multilayer films with Cu top layer is less than that of Cu single layer film. The Rrms of Cu/TaN multilayer films with TaN top layer is larger than that of TaN single layer film. With increasing L, the Rrms difference between multilayer films and the single layer films decreases.