Optics and Precision Engineering, Volume. 16, Issue 3, 500(2008)
Effect of post exposure bake temperature on thermal swelling of SU-8 photoresist
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[in Chinese], [in Chinese], [in Chinese]. Effect of post exposure bake temperature on thermal swelling of SU-8 photoresist[J]. Optics and Precision Engineering, 2008, 16(3): 500
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