Journal of Applied Optics, Volume. 43, Issue 6, 1158(2022)

Influence of input electrode of micro-channel plate on opening area ratio and its improvement

Pengfei WANG1... Xiangbiao QIU1,*, Aifei SHAO1, Sailin SUN1, Xiaoqing CONG1, Ge JIN1, Jianning SUN1, Jian WANG1, Fangjian QIAO1, Peng GAO1, Sheng ZHAO1 and Kunyang CHEN2 |Show fewer author(s)
Author Affiliations
  • 1North Night Vision Science and Technology (Nanjing) Research Institute Co., Ltd., Nanjing 211106, China
  • 2North Night Vision Technology Co., Ltd., Kunming 650217, China
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    Figures & Tables(12)
    Model of OAR influenced by electrode film
    Top view of coating in channel inner wall
    Effect of film thickness and aperture on opening area ratio of MCP
    Schematic diagram of NiCr laminated structure
    Physical drawing of NiCr laminated film and aperture measurement at MCP input terminal
    EDS energy spectrum of input terminal film when Cr∶Ni = 1∶5
    Physical drawing of film layer and aperture measurement of original coating process
    EDS energy spectrum of input terminal film prepared by original coating process
    • Table 1. Relationship between evaporation process and resistivity

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      Table 1. Relationship between evaporation process and resistivity

      蒸镀工艺电阻率/×10−6 Ω·m
      原工艺6.13
      工艺一5.74
      工艺二5.59
    • Table 2. Relationship between evaporation process and square resistance

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      Table 2. Relationship between evaporation process and square resistance

      蒸镀工艺开口面积比/%
      原工艺59.4
      工艺二61.7
    • Table 3. Relationship between lamination process and square resistance

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      Table 3. Relationship between lamination process and square resistance

      Cr∶NiMCP编号膜层厚度/nm电阻率/(×10−6 Ω·m)
      原镀膜工艺 对照(1∶1)0091-4232895.92
      0091-4412935.85
      1∶20091-4783061.51
      0091-4763121.36
      1∶40091-4792951.01
      0091-4842981.04
      1∶50091-4903040.93
      0091-4863060.89
    • Table 4. Comparison of MCP gain under 800 V voltage between original coating process and Cr∶Ni = 1∶5

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      Table 4. Comparison of MCP gain under 800 V voltage between original coating process and Cr∶Ni = 1∶5

      原工艺2 296
      输入Cr∶Ni=1∶52 436
      增益变化/%6.1
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    Pengfei WANG, Xiangbiao QIU, Aifei SHAO, Sailin SUN, Xiaoqing CONG, Ge JIN, Jianning SUN, Jian WANG, Fangjian QIAO, Peng GAO, Sheng ZHAO, Kunyang CHEN. Influence of input electrode of micro-channel plate on opening area ratio and its improvement[J]. Journal of Applied Optics, 2022, 43(6): 1158

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    Paper Information

    Category: Research Articles

    Received: Aug. 17, 2022

    Accepted: --

    Published Online: Nov. 18, 2022

    The Author Email:

    DOI:10.5768/JAO202243.0604016

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