Fig. 1. Temperature and electric field distribution in a high-reflectance coating with and without interface absorption.

Fig. 2. Designed and measured transmittance spectra of polarizer.

Fig. 3. Measured transmittance spectra of polarizer for three runs.

Fig. 4. Surface morphology of fused silica before and after annealing treatment .

Fig. 5. Surface morphology of BK7 glass cleaned by different methods examined by an AFM: (a) manually swabbing with lint-free wipes, (b) ultrasonic cleaning, (c) acid solvent etching.

Fig. 6. LIDT of antireflection coating with different cleaning methods (532 nm, , 10 ns).

Fig. 7. Optimization of deposition process.

Fig. 8. Measured LIDT of high-reflectance coating with different pre-melting processes.

Fig. 9. Number of damage site and damage morphology without and with laser conditioning.

Fig. 10. Absorption, defect density, and LIDT of coating with and without post-plasma treatment.

Fig. 11. Typical damage morphology with a fluence of (p-polarized wave), (p- and s-polarized waves).

Fig. 12. LIDT versus peak electric field for four kinds of polarizer: (a) p-polarized wave, (b) s-polarized wave.

Fig. 13. LIDT of polarizer beam splitter for a p-polarized wave in the 2012 damage competition of XLIV Annual Boulder Damage Symposium^[14].

Fig. 14. Dependence of residual stress of the coating on the deposition parameters.

Fig. 15. Schematic diagram of the in situ stress measurement system.

Fig. 16. Typical stress evolution curve of and films recorded with the in situ stress measurement system.