Optics and Precision Engineering, Volume. 31, Issue 2, 226(2023)

Adaptive optimization control method for overexposure of industrial camera

Wenlin WU1, Xiaobo LIAO1,2、*, Junzhong LI1, Jun ZHOU1, and Jian ZHUANG2
Author Affiliations
  • 1School of Manufacturing Science and Engineering, Key Laboratory of Testing Technology for Manufacturing Process, Minsitry of Education, Southwest University of Science and Technology, Mianyang6200, China
  • 2School of Mechanical Engineering, Xi’ an Jiaotong University, Xi’ an710049,China
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    CLP Journals

    [1] Ruoyu WANG, Fuyang YAN, Tundong LIU. Rapid and uniform exposure control for wafer motion imaging system[J]. Optics and Precision Engineering, 2024, 32(19): 2933

    [2] Ruoyu WANG, Fuyang YAN, Tundong LIU. Rapid and uniform exposure control for wafer motion imaging system[J]. Optics and Precision Engineering, 2024, 32(19): 2933

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    Wenlin WU, Xiaobo LIAO, Junzhong LI, Jun ZHOU, Jian ZHUANG. Adaptive optimization control method for overexposure of industrial camera[J]. Optics and Precision Engineering, 2023, 31(2): 226

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    Paper Information

    Category: Information Sciences

    Received: Jul. 4, 2022

    Accepted: --

    Published Online: Feb. 9, 2023

    The Author Email: LIAO Xiaobo (liaoxiaobo@swust.edu.cn)

    DOI:10.37188/OPE.20233102.0226

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