Journal of Semiconductors, Volume. 45, Issue 10, 102401(2024)

Single-fundamental-mode cryogenic (3.6 K) 850-nm oxide-confined VCSEL

Anjin Liu1,2、*, Chenxi Hao1,2, Jingyu Huo3, Hailong Han3, Minglu Wang1,2, Bao Tang4, Lingyun Li3, Lixing You3, and Wanhua Zheng2,5
Author Affiliations
  • 1Key Laboratory of Optoelectronic Materials and Devices, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
  • 2Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
  • 3Shanghai Key Laboratory of Superconductor Integrated Circuit Technology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
  • 4Accelink technologies co., Ltd, Wuhan 430205, China
  • 5Key Laboratory of Solid-State Optoelectronics Information Technology, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
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    References(16)

    [8] H Wu, W Fu, Z Liu et al. Cryogenic oxide-VCSEL at 2.8 K demonstrates record bandwidth f-3dB > 50 GHz, Pout > 14 mW and PAM-4 data rate up to 128 Gb/s. Proc Opt Fiber Commun Conf Exhibit (OFC), 1, M2D. 2(2024).

    [17] L A Coldren, S W Corzine, M L Mašanović. Diode lasers and photonic integrated circuits, 1, 1(2012).

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    Anjin Liu, Chenxi Hao, Jingyu Huo, Hailong Han, Minglu Wang, Bao Tang, Lingyun Li, Lixing You, Wanhua Zheng. Single-fundamental-mode cryogenic (3.6 K) 850-nm oxide-confined VCSEL[J]. Journal of Semiconductors, 2024, 45(10): 102401

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    Paper Information

    Category: Research Articles

    Received: Jul. 25, 2024

    Accepted: --

    Published Online: Dec. 5, 2024

    The Author Email: Liu Anjin (AJLiu)

    DOI:10.1088/1674-4926/24070025

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