Infrared and Laser Engineering, Volume. 45, Issue 4, 421001(2016)
Effect of deposition temperature on the structural and surface properties of AlN by plasma enhanced atomic layer deposition
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Chen Fang, Fang Xuan, Wang Shuangpeng, Niu Shouzhu, Fang Fang, Fang Dan, Tang Jilong, Wang Xiaohua, Liu Guojun, Wei Zhipeng. Effect of deposition temperature on the structural and surface properties of AlN by plasma enhanced atomic layer deposition[J]. Infrared and Laser Engineering, 2016, 45(4): 421001
Paper Information
Category: 先进光学材料
Received: Aug. 21, 2015
Accepted: Sep. 17, 2015
Published Online: May. 11, 2016
The Author Email: Fang Chen (cf198909@163.com)
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