Optics and Precision Engineering, Volume. 30, Issue 1, 71(2022)

Research on resist-layer thickness by spin-coating on curved substrate

Mengtao XIE1...2, Junbiao LIU1,2,*, Pengfei WANG1, Lixin ZHANG1, and Li HAN12 |Show fewer author(s)
Author Affiliations
  • 1Institute of Electrical Engineering, Chinese Academy of Sciences, Beijing0090, China
  • 2University of Chinese Academy of Sciences, Beijing100049, China
  • show less
    Figures & Tables(7)
    Force diagram of non-Newtonian fluid on curved substrate
    Relationship between shear rate and stress of 950 K PMMA C% resist-coating
    Contrast of film thickness obtained at rotating speed of 2 000 r/min
    Contrast of film thickness obtained at rotating speed of 3 000 r/min
    Theoretical curve of center thickness at different rotating speeds
    Thickness of reference given by kayakuAM[18]
    Variation of film thickness with vector radius
    Tools

    Get Citation

    Copy Citation Text

    Mengtao XIE, Junbiao LIU, Pengfei WANG, Lixin ZHANG, Li HAN. Research on resist-layer thickness by spin-coating on curved substrate[J]. Optics and Precision Engineering, 2022, 30(1): 71

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: Micro/Nano Technology and Fine Mechanics

    Received: Jul. 18, 2021

    Accepted: --

    Published Online: Jan. 20, 2022

    The Author Email: LIU Junbiao (liujb@mail.iee.ac.cn)

    DOI:10.37188/OPE.2021.0477

    Topics