Optics and Precision Engineering, Volume. 30, Issue 1, 71(2022)
Research on resist-layer thickness by spin-coating on curved substrate
Fig. 2. Relationship between shear rate and stress of 950 K PMMA C% resist-coating
Fig. 3. Contrast of film thickness obtained at rotating speed of 2 000 r/min
Fig. 4. Contrast of film thickness obtained at rotating speed of 3 000 r/min
Fig. 5. Theoretical curve of center thickness at different rotating speeds
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Mengtao XIE, Junbiao LIU, Pengfei WANG, Lixin ZHANG, Li HAN. Research on resist-layer thickness by spin-coating on curved substrate[J]. Optics and Precision Engineering, 2022, 30(1): 71
Category: Micro/Nano Technology and Fine Mechanics
Received: Jul. 18, 2021
Accepted: --
Published Online: Jan. 20, 2022
The Author Email: LIU Junbiao (liujb@mail.iee.ac.cn)