[1] [1] Wang J, Lu J, Hocevar S B, et al. Anal. Chem., 2000, 72: 3218.

[2] [2] Sunka P. Physics of Plasmas, 2001, 8(5): 2587.

[3] [3] Modi A, Koratkar N, Lass E, et al. Nature, 2003, 424: 171.

[4] [4] Zimmermann S, Wischhusen S, Müller J. Sensors and Actuators B, 2000, 63: 159.

[5] [5] Miller R A, Nazarov E G, Eiceman G A, et al. Sensors and Actuators A, 2001, 91: 301.

[6] [6] Zhang W, Fisher T S, Garimella S V. Journal of Applied Physics, 2004, 96(11): 6066.

[8] [8] Miclea M, Franzke J. Plasma Chemistry and Plasma Processing, 2007, 27(2): 205.

[9] [9] Wang Y Q, Cal A L, Sun R X, et al. 8th International Conference on Electronic Measurement and Instruments, Xi’an, China, 16-18, August, 2007. 577.

[10] [10] Cserfalvi T, Mezeit P, Apai P. J. Phys. D: Appl. Phys., 1993, 26: 2184.

[11] [11] Cserfalvi T, Mezeit P. J. Anal. At. Spectrom., 2003, 18: 596.

[12] [12] Park Y S, Ku S H, Kim H J, et al. Spectrochimica Acta Part B, 1998, 53: 1167.

[13] [13] Cserfalvi T, Mezei P. J. Anal. At. Spectrom., 1994, 9: 345.

[14] [14] Cserfalvi T, Mezei P. Fresenius J. of Anal. Chem., 1996, 355: 813.

[15] [15] Mezei P, Cserfalvi T, Jánossy M. J. Anal. At. Spectrosc., 1997, 12: 1203.

[16] [16] Mezei P, Cserfalvi T, Jánossy M. J. Phys. D: Appl. Phys., 1998, 31: L41.

[17] [17] Jenkins G, Manz A. Journal of Micromechanics and Microengineering, 2002, 12: N19.

[18] [18] Kim H J, Lee J H, Kim M Y, et al. Spectrochim. Acta, Part B, 2000, 55B: 823.

[19] [19] Titov V A, Rybkin V V, Maximov A I, et al. Plasma Chemistry and Plasma Processing, 2005, 25(5): 503.

[20] [20] Mezei P, Cserfalvi T. J. Phys. D: Appl. Phys., 2006, 39: 2534.

[21] [21] Yagov V V, Gentsina M L. J. Anal. Chem., 2004, 59: 64.

[22] [22] Yagov V V, Gentsina M L, Zuev B K. J. Anal. Chem., 2004, 59: 1037.

[23] [23] Mezei P, Cserfalvi T, Csillag L. Journal of Physics D: Applied Physics, 2005, 38: 2804.

[24] [24] Jenkins G, Franzke J, Manz A. Lab-on-a-Chip, 2005, 5: 711.

[25] [25] Webb M R, Andrade F J, Gamez G, et al. J. Anal. At. Spectrom., 2005, 20: 1218.

[26] [26] Mottaleb M A, Woo Y A, Kim H J. Microchem. J. 2001, 69: 219.

[27] [27] Webb M R, Andrade F J, Hieftje G M. Analytical Chemistry, 2007, 79(20): 7899.

[28] [28] Webb M R, Andrade F J, Hieftje G M. Analytical Chemistry, 2007, 79(20): 7807.

[29] [29] Zhu Z L, Chan G C Y, Ray S J. Analytical Chemistry, 2008, 80(18): 7043.

[30] [30] Marcus R K, Davis W C. Anal. Chem., 2001, 73: 2903.

[31] [31] Davis W C, Marcus R K. Spectrochimica Acta Part B, 2002, 57: 1473.

[32] [32] Venzie J L, Marcus R K. Anal. Bioanal. Chem., 2005, 381: 96.

[33] [33] Davis W C, Marcus R K. J. Anal. At. Spectrom., 2001, 16: 931.

[34] [34] Que L, Wilson C G, Gianchandani Y B. Journal of Microelectromechanical System, 2005, 14(2): 185.

[35] [35] Faure G, Shkolnik S M. J. Phys. D: Appl. Phys., 1998, 31: 1212.

[36] [36] Andre P, Barinov Y, Faure G, et al. J. Phys. D: Appl. Phys., 2001, 34: 3456.

[37] [37] Andre P, Aubreton J, Barinov Y, et al. J. Phys. D: Appl. Phys., 2002, 35: 1846.

[38] [38] Wilson C G, Gianchandani Y B. IEEE Trans. Electron Devices, 2002, 49: 2317.

[39] [39] De Baerdemeaker F, Monte M, Leys C. IEEE Transaction on Plasma Science, 2005, 33: 492.

[40] [40] De Baerdemaeker F, Simek M, Leys C. Journal of Physics D-Applied Physics, 2007, 40(9): 2801.

[41] [41] De Baerdemaeker F, Simek M, Leys C, Verstraete W. Plasma Chemistry and Plasma Processing, 2007, 27(4): 473.

[42] [42] De Baerdemaeker F, Simek M, Schmidt J, Leys C. Plasma Sources Science & Technology, 2007, 16(2): 341.

[43] [43] Nikiforov A Y, Leys C. Plasma Sources Science & Technology, 2007, 16(2): 273.

[44] [44] Wu J, Yu J, Li J, et al. Spectrochimica Acta Part B, 2007, 62: 1269.

[45] [45] Wilson C G, Gianchandani Y B. Proc. IEEE Int. Conf. MEMS, 2002, 248.

[46] [46] Lim J, Reyes D R, Manz A. Lap Chip, 2003, 3: 137.

[47] [47] Jenkins G, Manz A. Proc. Micro Total Analysis Systems, 2001. 349.

[48] [48] Karanassios V. Spectrochimica Acta Part B, 2004, 59: 909.

[49] [49] Miclea M, Kunze K, Franzke J, et al. Spectrochim. Acta Part B, 2002, 57: 1585.