Acta Physica Sinica, Volume. 69, Issue 2, 025201-1(2020)

Effects of reflection of electrons and negative ions on magnetized electronegative and collisional plasma sheath

Hui-Ping Liu* and Xiu Zou
Figures & Tables(8)
Geometry of the electronegative magnetized plasma sheath model.电负性等离子体磁鞘模型示意图
The effects of negative ions concentration and temperature on the lower limit of ion Mach number (, , , , ): (a) Boltzmannian model; (b) reflection model.负离子浓度和温度对离子马赫数下限的影响(, , , , ) (a)玻尔兹曼模型; (b)反射模型
The effect of wall potential on the lower limit of ion Mach number: (a) Whole; (b) part (, , , ).基板电势对离子马赫数下限的影响 (a)整体; (b)局部 (, , , )
The effect of the sheath edge electric field on the lower limit of ion Mach number (, , , , , ).鞘边电场对离子马赫数下限的影响(, , , , , )
The effect of collision parameter on the lower limit of ion Mach number (, , , , , ).碰撞参数对离子马赫数下限的影响(, , , , , )
The effect of magnetic field angle on the lower limit of ion Mach number (, , , , , ).磁场角度对离子马赫数下限的影响(, , , , , )
The normalized charged particle density ().鞘层中带电粒子密度分布()
The normalized charged particle density ().鞘层中带电粒子密度分布()
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Hui-Ping Liu, Xiu Zou. Effects of reflection of electrons and negative ions on magnetized electronegative and collisional plasma sheath[J]. Acta Physica Sinica, 2020, 69(2): 025201-1

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Paper Information

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Received: Aug. 29, 2019

Accepted: --

Published Online: Nov. 9, 2020

The Author Email:

DOI:10.7498/aps.69.20191307

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