Acta Physica Sinica, Volume. 69, Issue 2, 025201-1(2020)
Fig. 1. Geometry of the electronegative magnetized plasma sheath model.电负性等离子体磁鞘模型示意图
Fig. 2. The effects of negative ions concentration and temperature on the lower limit of ion Mach number ( , , , , ): (a) Boltzmannian model; (b) reflection model. 负离子浓度和温度对离子马赫数下限的影响( , , , , ) (a)玻尔兹曼模型; (b)反射模型
Fig. 3. The effect of wall potential on the lower limit of ion Mach number: (a) Whole; (b) part ( , , , ). 基板电势对离子马赫数下限的影响 (a)整体; (b)局部 ( , , , )
Fig. 4. The effect of the sheath edge electric field on the lower limit of ion Mach number ( , , , , , ). 鞘边电场对离子马赫数下限的影响( , , , , , )
Fig. 5. The effect of collision parameter on the lower limit of ion Mach number ( , , , , , ). 碰撞参数对离子马赫数下限的影响( , , , , , )
Fig. 6. The effect of magnetic field angle on the lower limit of ion Mach number ( , , , , , ). 磁场角度对离子马赫数下限的影响( , , , , , )
Fig. 7. The normalized charged particle density ( ). 鞘层中带电粒子密度分布( )
Fig. 8. The normalized charged particle density ( ). 鞘层中带电粒子密度分布( )
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Hui-Ping Liu, Xiu Zou.
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Received: Aug. 29, 2019
Accepted: --
Published Online: Nov. 9, 2020
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