Acta Photonica Sinica, Volume. 35, Issue 2, 224(2006)

Influence of Deposited Pressure on Refractive Index and Packing Density of ZrO2 Coatings by Electron Beam Evaporation

Hao Dianzhong*... Wu Fuquan, Ma Lili, Yan Bin and Zhang Xu |Show fewer author(s)
Author Affiliations
  • [in Chinese]
  • show less
    References(13)

    [1] [1] Kong W J,Wu F Q,Hao D Z,et al. Acta Photonica Sinica,2004,33(11): 1373~1376

    [2] [2] Li M Y,Gu P F. Acta Photonica Sinica,2003,32(10):1232~1233

    [3] [3] Gu P F,Yang Y M,Chen H X,et al. Acta Photonica Sinica,2003,32(7): 837~839

    [4] [4] Dobrowolski J A,Grant P D,Simpson R,et al.Investigation of the evaporation process conditions on the optical constants of zirconia films. Appl Opt,1989,28(18): 3997

    [5] [5] Pereyra-Perea E,Estrada-ya ez M R,García M,et al.Preliminary studies on luminescent terbium-doped ZrO2thin films prepared by the sol-gel process. J Phys D:Appl Phys,1998,31(3): 7~10

    [6] [6] Gao P T,Meng L J,Dos Santos M P. Influence of sputtering power and the substrate-target distance on the properties of ZrO2 films prepared by RF reactive sputtering. Thin Solid Films,2000,(377-378): 557~561

    [7] [7] Kim J S,Marzouk H A,Reucroft P K. Deposition and structural characterization of ZrO2 and Yttria-stabilized ZrO2 films by chemical vapor deposition. Thin Solid Films,1995,254: 33~38

    [8] [8] Juan Pedro Holgado Vazquez,Manuel Perez Sanchez,Juan Pedro Espinos Manzorro,et al. Corrosion resistan ZrO2 thin films prepared at room temperature by lon beam induced chemical vapour deposition. Surface & Coatings Technology,2002,151-152: 449~453

    [9] [9] Lee C C,Wei D T,Hsu J C,et al. Influence of oxygen on some oxide films by lon beam sputter deposition. Thin Solid Films,1996,290-291: 88~93

    [10] [10] Lee C C,Liu Y Y,Jiang C C. Improvement of the inhomogeneity of optical thin films by lon-assisted deposition. J of Modern Optics,1996,43: 1149~1154

    [11] [11] Zhang N L,Song Zh L,Shen Q W,et al. Microstructural and electrical properties of ZrO2 fhin films prepared on silicon on insulator with thin top silicon. Chinese Phys Lett,2003,20(2): 273~276

    [12] [12] Zhang N L,Song Zh L,Shen Q W,et al. High-Quality ZrO2 thin films deposited on silicon by high vacuum electron beam evaporation. Chinese Phys Lett,2002,19(3): 395~397

    [13] [13] Guo P F. Coating Technology. Hangzhou: Zhejiang University Press,1990.185~187

    CLP Journals

    [1] LUO Hai-han, LIU Ding-quan, YIN Xin, CAI Yuan, ZHANG Li. Title Influence of Deposited Temperature on Packing Density of SiO Thin Films[J]. Acta Photonica Sinica, 2012, 41(2): 170

    Tools

    Get Citation

    Copy Citation Text

    Hao Dianzhong, Wu Fuquan, Ma Lili, Yan Bin, Zhang Xu. Influence of Deposited Pressure on Refractive Index and Packing Density of ZrO2 Coatings by Electron Beam Evaporation[J]. Acta Photonica Sinica, 2006, 35(2): 224

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category:

    Received: Apr. 13, 2005

    Accepted: --

    Published Online: Jun. 3, 2010

    The Author Email: Dianzhong Hao (dzhhao2@163.com)

    DOI:

    CSTR:32186.14.

    Topics