Research Progress and Development Trend of Extreme Ultraviolet Lithography Source

Nan Lin; Wenhe Yang; Yunyi Chen; Xin Wei; Cheng Wang; Jiaoling Zhao; Yujie Peng; Yuxin Leng

doi:10.3788/LOP202259.0922002

Laser & Optoelectronics Progress, Volume. 59, Issue 9, 0922002(2022)

Research Progress and Development Trend of Extreme Ultraviolet Lithography Source

Nan Lin^1,2、*, Wenhe Yang^1,2, Yunyi Chen^1,2, Xin Wei^1,2, Cheng Wang², Jiaoling Zhao², Yujie Peng², and Yuxin Leng^2、**

Author Affiliations

¹School of Microelectronics, Shanghai University, Shanghai 200072, China

²Department of Precision Optics Engineering, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

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Nan Lin, Wenhe Yang, Yunyi Chen, Xin Wei, Cheng Wang, Jiaoling Zhao, Yujie Peng, Yuxin Leng. Research Progress and Development Trend of Extreme Ultraviolet Lithography Source[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922002

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Paper Information

Category: Optical Design and Fabrication

Received: Jan. 21, 2022

Accepted: Feb. 25, 2022

Published Online: May. 10, 2022

The Author Email: Lin Nan (nanlin@siom.ac.cn), Leng Yuxin (lengyuxin@mail.siom.ac.cn)

DOI:10.3788/LOP202259.0922002

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology