Acta Optica Sinica, Volume. 20, Issue 4, 543(2000)
Phase Shifting Mask for 0.35 μm Contact Holes
Aerial image distribution of a 0.35 μm contact hole with traditional mask, rim phase shifting mask (PSM), partial rim PSM, attenuating PSM are calculated based on Hopkins model, and the optimum parameters of different PSM are obtained. Attenuated PSM in enhancing resolution and improving the depth of focus in photolithography is of the most effective among them, especially when partial coherent factor (σ) is small.
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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Phase Shifting Mask for 0.35 μm Contact Holes[J]. Acta Optica Sinica, 2000, 20(4): 543