Acta Photonica Sinica, Volume. 32, Issue 6, 653(2003)

Fabrication of Submicron Elements by Ion Beam Etching

[in Chinese]1, [in Chinese]2, [in Chinese]3, [in Chinese]2, [in Chinese]1, [in Chinese]1, [in Chinese]1, and [in Chinese]1
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    References(9)

    [1] [1] Kley E B,Schnabel B,Hübner H,et al.Application of metallic subwavelength gratings for polarization devices.Proc SPIE,2863: 166~174

    [2] [2] Bauer C,Giessen H,Schnabel B,et al.Circular dielectric gratings acting as resonators for solid state polymer lasers.Proc SPIE,2001,4440:194~201

    [3] [3] Malek C K,Hartley F T,Neogi J.Focused ion beam direct micromachining of DOEs.Proc SPIE,2000,4075:167~172

    [4] [4] Amako J,Nakao H,Ochiai S. Fabrication of continuous surface-relief gratings using a high-precision diamond-cutting.Opt Eng,2001,40(8):1456~1463

    [5] [5] Schindler A,Hawnsel T,Flamm D,et al.Ion beam and plasma jet etching for optical component fabrication.Proc SPIE,2001,4440:217~227

    [6] [6] Motanedi M E,Southwell W H,Gunning W J. Antireflection surfaces in silicon using binary optics technology.Appl Opt,1992,31(22): 4371~4376

    [7] [7] Kumar A, Biebuyck H A, Whitesides G M.Patterned self-assembled monolayers: applications in materials science.Langmuir,1994,10(5):1498~1551

    [8] [8] Kumar A, Whitesides G M.Patterned condensation figures as optical diffraction gratings.Science, 1994,263: 60~62

    [9] [9] Lu G, Li W, Yao J,et al. Fabricating ordered two-dimensional arrays of polymer rings with submicrometer-sized features on patterned self-assembled monolayers by dewetting.Adv Mater,2002,14(15): 1049~1053

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Fabrication of Submicron Elements by Ion Beam Etching[J]. Acta Photonica Sinica, 2003, 32(6): 653

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    Paper Information

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    Received: Jun. 18, 2002

    Accepted: --

    Published Online: Sep. 18, 2007

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