Chinese Journal of Quantum Electronics, Volume. 17, Issue 4, 365(2000)
The Characteric of Surface Roughness of Si3N4 Thin Film
The spatial distribution of the ECR plasma density in the reaction chamber has been measured by using a eccentric langmuir probe. The surface roughness characteristic of Si3N4 thin film has been researched with the profilometer Telystep-Hobbson. The results show the surface of this kind of thin film made by ECR-PECVD technology is very smooth.
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[in Chinese]. The Characteric of Surface Roughness of Si3N4 Thin Film[J]. Chinese Journal of Quantum Electronics, 2000, 17(4): 365
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