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Acta Optica Sinica, Volume. 34, Issue 9, 911002(2014)

Source and Mask Optimization Using Stochastic Parallel Gradient Descent Algorithm in Optical Lithography

Li Zhaoze1,2、*, Li Sikun1, and Wang Xiangzhao1,2
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    Article index updated:May. 24, 2024

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    Li Zhaoze, Li Sikun, Wang Xiangzhao. Source and Mask Optimization Using Stochastic Parallel Gradient Descent Algorithm in Optical Lithography[J]. Acta Optica Sinica, 2014, 34(9): 911002

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    Paper Information

    Category: Imaging Systems

    Received: Feb. 2, 2014

    Accepted: --

    Published Online: Aug. 12, 2014

    The Author Email: Zhaoze Li (lizhaozezone@163.com)

    DOI:10.3788/aos201434.0911002

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology