Acta Optica Sinica, Volume. 30, Issue 6, 1667(2010)

A New Optical Proximity Correction with Mapping Model between Segments and Control Sites

Yang Yiwei* and Shi Zheng
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  • [in Chinese]
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    The mapping between segments and control sites is an important factor that influences the correction result of model-based optical proximity correction (MB-OPC). The existing mapping schemes are rule-based and it is either the inaccurate one-to-one mapping or the time-consuming all-to-one mapping.A new MB-OPC with model-based mapping between segments and control sites is proposed. The mapping model is a charasteristic area derived from gradient of intensity,and it can be a one-to-one mapping or a multiple-to-one mapping. The mapping can be applied to all the control sites in MB-OPC,and there is no need to recalculate repeatily. The experimental results show that the variance of edge placement error (EPE) of MB-OPC with model-based mapping is significantly improved and the run time is not significantly increased.

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    Yang Yiwei, Shi Zheng. A New Optical Proximity Correction with Mapping Model between Segments and Control Sites[J]. Acta Optica Sinica, 2010, 30(6): 1667

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    Paper Information

    Category: Instrumentation, Measurement and Metrology

    Received: Jun. 25, 2009

    Accepted: --

    Published Online: Jun. 7, 2010

    The Author Email: Yiwei Yang (yangyw@vlsi.zju.edu.cn)

    DOI:10.3788/aos20103006.1667

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