Acta Optica Sinica, Volume. 30, Issue 6, 1667(2010)
A New Optical Proximity Correction with Mapping Model between Segments and Control Sites
The mapping between segments and control sites is an important factor that influences the correction result of model-based optical proximity correction (MB-OPC). The existing mapping schemes are rule-based and it is either the inaccurate one-to-one mapping or the time-consuming all-to-one mapping.A new MB-OPC with model-based mapping between segments and control sites is proposed. The mapping model is a charasteristic area derived from gradient of intensity,and it can be a one-to-one mapping or a multiple-to-one mapping. The mapping can be applied to all the control sites in MB-OPC,and there is no need to recalculate repeatily. The experimental results show that the variance of edge placement error (EPE) of MB-OPC with model-based mapping is significantly improved and the run time is not significantly increased.
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Yang Yiwei, Shi Zheng. A New Optical Proximity Correction with Mapping Model between Segments and Control Sites[J]. Acta Optica Sinica, 2010, 30(6): 1667
Category: Instrumentation, Measurement and Metrology
Received: Jun. 25, 2009
Accepted: --
Published Online: Jun. 7, 2010
The Author Email: Yiwei Yang (yangyw@vlsi.zju.edu.cn)