Electro-Optic Technology Application, Volume. 32, Issue 4, 8(2017)

Research on Optical Super-resolution Technology

NIU Ya-jun1... ZHA Wei-yi1, CHANG Jun1, SHEN Ben-lan1, YANG Hai-bo2, YAN Xiu-sheng2 and TIAN Hong2 |Show fewer author(s)
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  • 1[in Chinese]
  • 2[in Chinese]
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    References(18)

    [1] [1] Park S C, Park M K, Kang M G. Super-resolution image reconstruction: a technical overview[J]. Signal Processing Magazine, IEEE, 2003, 20(3): 21-36.

    [2] [2] Zalevsky Z, Mendlovic D. Optical superresolution[M]. Springer, 2004.

    [3] [3] Rayleigh L. On the manufacture and theory of diffraction-gratings[J]. Philos Mag, 1874, 47: 193.

    [5] [5] Synge E H. A suggested method for extending microscopic resolution into the ultra-microscopic region[J]. The London, Edinburgh, and Dublin Philosophical Magazine and Journal of Science, 1928, 6(35): 356-362.

    [7] [7] Huang B, Bates M, Zhuang X. Super resolution fluorescence microscopy[J]. Annual Review of Biochemistry, 2009, 78: 993.

    [8] [8] Heintzmann R, Gustafsson M G L. Subdiffraction resolution in continuous samples[J]. Nature Photonics, 2009, 3(7): 362-364.

    [9] [9] Minsky M. Microscopy Apparatus[P]. US Patent, 3013467, 1961.

    [12] [12] Gustafsson M G L. Nonlinear structured-illumination microscopy: wide-field fluorescence imaging with theoretically unlimited resolution[J]. Proceedings of the National Academy of Sciences of the United States of America. 2005, 102(37): 13081-13086.

    [13] [13] Hell S W, Wichmann J. Breaking the diffraction resolution limit by stimulated emission: stimulated-emission-depletion fluorescence microscopy[J]. Optics Letters, 1994, 19(11): 780-782.

    [14] [14] Zhuang X. Nano-imaging with STORM[J]. Nature Photonics, 2009, 3(7): 365.

    [16] [16] Wiley J N, Fu T Y, Tanaka T, et al. Phase-shift mask pattern accuracy requirements and inspection technology[C]//International Society for Optics and Photonics, 1991: 346-355.

    [18] [18] Luehrmann P F, Van Oorschot P, Jasper H, et al. 0.35 μm lithography using off-axis illumination[C]//Proceedings-SPIE the International Society for Optical Engineering, SPIE International Society for Optical, 1993: 103-103.

    [19] [19] Levenson M D, Viswanathan N S, Simpson R A. Improving resolution in photolithography with a phase-shifting mask[J]. Electron Devices, IEEE Transactions on, 1982, 29(12): 1828-1836.

    [20] [20] Di Francia G T. Super-gain antennas and optical resolving power[J]. Nuovo Cimento (1943-1954), 1952, 9: 426-438.

    [21] [21] Davis J A, Guertin J, Cottrell D M. Diffraction-free beams generated with programmable spatial light modulators[J]. Applied Optics, 1993, 32(31): 6368-6370.

    [23] [23] Katz B, Rosen J. Super-resolution in incoherent optical imaging using synthetic aperture with Fresnel elements[J]. Opt Express, 2010, 18(2): 962-972.

    [25] [25] Canales V F, de Juana D M, Cagigal M P. Superresolution in compensated telescopes[J]. Optics Letters, 2004, 29(9): 935-937.

    [26] [26] Neil M A A, Jukaitis R, Wilson T, et al. Optimized pupil-plane filters for confocal microscope point-spread function engineering[J]. Optics Letters, 2000, 25(4): 245-247.

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    NIU Ya-jun, ZHA Wei-yi, CHANG Jun, SHEN Ben-lan, YANG Hai-bo, YAN Xiu-sheng, TIAN Hong. Research on Optical Super-resolution Technology[J]. Electro-Optic Technology Application, 2017, 32(4): 8

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    Paper Information

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    Received: Jul. 7, 2017

    Accepted: --

    Published Online: Oct. 30, 2017

    The Author Email:

    DOI:

    CSTR:32186.14.

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