Acta Optica Sinica, Volume. 37, Issue 1, 131002(2017)
Influence of Annealing Technology on Spectral Properties of SiCx Thin Films Containing Silicon Quantum Dots
Figures & Tables(0)
Tools
Get Citation
Copy Citation Text
Zhao Fei, Yang Wen, Chen Xiaobo, Yang Peizhi. Influence of Annealing Technology on Spectral Properties of SiCx Thin Films Containing Silicon Quantum Dots[J]. Acta Optica Sinica, 2017, 37(1): 131002
Paper Information
Category: Thin Films
Received: Aug. 23, 2016
Accepted: --
Published Online: Jan. 13, 2017
The Author Email: Fei Zhao (18487073495@163.com)
© Copyright 2018-2021 | Chinese Laser Press.
All Rights Reserved 沪ICP备15018463号-20