[1] [1] Sun W, Li G, Li H P, et al. Appl. Phys. Lett., 2007, 101: 123302.

[2] [2] Fang Z, Qiu Y, Lou Y . J. Phys. D: Appl. Phys., 2003, 36: 2980.

[3] [3] Deng X T, Shi J J . Appl. Phys. Lett., 2005, 87: 153901.

[4] [4] Plaksin V Y, Penkov O V, Lee H J. Plasma Sci. Technol., 2010, 12: 688.

[5] [5] Raizer Y P. Gas Discharge Physics (Springer, Berlin). 1991, Chap. 12.

[6] [6] Kanazawa S, Kogoma M, Moriwaki T. J. Phys. D: Appl. Phys., 1988, 21: 838.

[7] [7] Massines F, Gherardi N, Naude N, et al. Eur. Phys. J. Appl. Phys., 2009, 47: 22805.

[8] [8] Wang Q, Sun J Z, Wang D Z. Phys. Plasmas, 2011, 18: 103504.

[9] [9] Wang C, Zhang G, Wang X. Vacuum, 2012, 86: 960.

[10] [10] Yang D Z, Wang W C, Li S Z, et al. J. Phys. D: Appl. Phys., 2010, 43: 455202.

[11] [11] Li X C, Niu D Y, Yin Z Q, et al. Phys. Plasmas, 2012, 19: 083505.

[12] [12] Pei X, Lu X, Liu J, et al. J. Phys. D: Appl. Phys., 2012, 45: 165205.

[13] [13] Machala Z, Laux C, Kruger C. IEEE Trans. Plasma Sci., 2005, 33: 320.

[14] [14] Bruggeman P, Liu J J, Degroote J, et al. J. Phys. D: Appl. Phys., 2008, 41: 215201.

[15] [15] Luo H, Liang Z, Lv B, et al. Appl. Phys. Lett., 2007, 91: 221504.

[16] [16] Walsh J L, Iza F, Janson N B, et al. J. Phys. D: Appl. Phys., 2010, 43: 075201.