Acta Photonica Sinica, Volume. 49, Issue 12, 216(2020)
Development of Polycarbonate High Strength Ultra-low Reflectivity Film
Figures & Tables(16)
Fig. 3. Surface roughness of substrate at different plasma treatment times
Fig. 4. The surface roughness of the substrate during different plasma treatment times
Table 1. Technical indexes of subtracting the reverse membrane
View tableView in ArticleTable 1. Technical indexes of subtracting the reverse membrane
Parameters Indicators Substrate Polycarbonate Incident angle/（º） 0 Spectral range/nm 430~700 Absolute reflectivity/% <0.15
Table 2. Polycarbonate synthesis and performance
View tableView in ArticleTable 2. Polycarbonate synthesis and performance
Performance Numerical Bibulous rate/% 0.15 Modulus of elasticity in tension/MPa 2 200~2 500 Bending strength/MPa 106 Coefficient of linear expansion/(10-5K-1) 6~7 Brinell hardness/MPa 97~104 Transmittance magnitude/% 87~90
Table 3. Vacuum cooling parameters
View tableView in ArticleTable 3. Vacuum cooling parameters
Annealing
temperature/℃
Annealing time/h Ion source energy Film stress/MPa Voltage/V Current/mA Annealing before After annealing Sample1 120 1 300 300 -265 -205 Sample2 120 2 300 300 -253 -213 Sample3 120 3 300 300 -256 -209 Sample4 120 4 300 300 -258 -224
Table 4. Monolayer stress of the two materials
View tableView in ArticleTable 4. Monolayer stress of the two materials
Deposition time/s Single layer stress/MPa TiO2 SiO2 30 -426 -476 60 -455 -477 90 -484 -398
Table 5. Notched ion source process parameters record table
View tableView in ArticleTable 5. Notched ion source process parameters record table
Membrane layer Material Voltage/V Current/mA Acc/V O2/sccm Ar/sccm 1~2 TiO2 800 800 150 90 10 SiO2 800 800 150 60 8 3~8 TiO2 500 500 150 90 10 SiO2 500 500 150 60 8 TiO2 500 500 150 90 10 SiO2 500 500 150 60 8 TiO2 500 500 150 90 10 SiO2 500 500 150 60 8 9~10 TiO2 800 800 150 90 10 SiO2 800 800 150 60 8
Table 6. Layered gradient stress of anti-reflection film
View tableView in ArticleTable 6. Layered gradient stress of anti-reflection film
Membrane layer Stress/MPa 1~2 -132 1~8 -84 1~10 -96
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Dong-mei LIU, Bo-yang WEI, Xiu-hua FU, Jing ZHANG, Suo-tao DONG, Shuang LI. Development of Polycarbonate High Strength Ultra-low Reflectivity Film[J]. Acta Photonica Sinica, 2020, 49(12): 216
Paper Information
Category: Thin Films
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Published Online: Mar. 11, 2021
The Author Email: WEI Bo-yang (2824155502@qq.com)
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