Opto-Electronic Engineering, Volume. 47, Issue 6, 190387(2020)
DMD maskless lithography stitching error correction based on motion compensation
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Jiang Xu, Yang Xu, Liu Hong, Hu Jun, Wang Yingzhi. DMD maskless lithography stitching error correction based on motion compensation[J]. Opto-Electronic Engineering, 2020, 47(6): 190387
Paper Information
Category: Article
Received: Jul. 5, 2019
Accepted: --
Published Online: Oct. 27, 2020
The Author Email: Xu Jiang (273944219@qq.com)
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