Research on Mask Defect Inspection and Compensation Techniques in Extreme Ultraviolet Lithography

Wei Cheng; Sikun Li; Zinan Zhang; Xiangzhao Wang

doi:10.3788/LOP202259.0922022

Laser & Optoelectronics Progress, Volume. 59, Issue 9, 0922022(2022)

Research on Mask Defect Inspection and Compensation Techniques in Extreme Ultraviolet Lithography

Wei Cheng^1,2, Sikun Li^1,2, Zinan Zhang^1,2, and Xiangzhao Wang^1,2、*

¹Laboratory of Information Optics and Opt-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

show less

Abstract Get PDF(in Chinese)

Cited By

Article index updated: Jun. 6, 2024

The article is cited by 1 article(s) CLP online library. (Some content might be in Chinese.)

Tools

Get Citation

Copy Citation Text

Wei Cheng, Sikun Li, Zinan Zhang, Xiangzhao Wang. Research on Mask Defect Inspection and Compensation Techniques in Extreme Ultraviolet Lithography[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922022

Download Citation

EndNote(RIS)BibTex Plain Text

Set citation alerts for article

Save article for my favorites

Paper Information

Category: Optical Design and Fabrication

Received: Mar. 28, 2022

Accepted: Apr. 12, 2022

Published Online: May. 10, 2022

The Author Email: Wang Xiangzhao (wxz26267@siom.ac.cn)

DOI:10.3788/LOP202259.0922022

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology