Acta Optica Sinica, Volume. 37, Issue 10, 1031001(2017)
Spot Effect in Optical Constant Characterization of Thin Films Fabricated by Ion Beam Sputtering
Fig. 1. Major axis length of spot on sample surface versus incident angle
Fig. 2. Area of spot on sample surface versus incident angle
Fig. 3. Measured results of elliptical polarization paremeters of Ta2O5 films. (a) ψ(λ,θ); (b) Δ(λ,θ)
Fig. 4. Measured results of elliptical polarization paremeters of HfO2 films. (a) ψ(λ,θ); (b) Δ(λ,θ)
Fig. 5. (a) Constant term of refractive index, (b) film layer thickness, and (c) surface layer thickness of Ta2O5 films versus major axis length of elliptic spot
Fig. 6. (a) Constant term of refractive index, (b) film layer thickness, and (c) surface layer thickness of HfO2 films versus major axis length of elliptic spot
Fig. 7. Profilogram of HfO2 film surface
Fig. 8. Profilogram of Ta2O5 film surface
Fig. 9. Measured and fitting results of reflectivity of Ta2O5 films by reflectance spectroscopy method
Fig. 10. Measured and fitting results of reflectivity of HfO2 films by reflectance spectroscopy method
Fig. 11. Schematic of spot change in spectroscopic ellipsometry measurement
Get Citation
Copy Citation Text
Huasong Liu, Xiao Yang, Dandan Liu, Chenghui Jiang, Shida Li, Yiqin Ji, Feng Zhang, Lishuan Wang, Yugang Jiang, Deying Chen. Spot Effect in Optical Constant Characterization of Thin Films Fabricated by Ion Beam Sputtering[J]. Acta Optica Sinica, 2017, 37(10): 1031001
Category: Thin Films
Received: Apr. 7, 2017
Accepted: --
Published Online: Sep. 7, 2018
The Author Email: Ji Yiqin (ji_yiqin@yahoo.com)