Opto-Electronic Engineering, Volume. 50, Issue 3, 220328(2023)

Liquid-assisted laser fabrication of hard materials and applications

Meiling Luan1... Jiaxin Zheng1, Xiangchao Sun1 and Xueqing Liu1,* |Show fewer author(s)
Author Affiliations
  • 1[in Chinese]
  • 1State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun, Jilin 130012, China
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    Figures & Tables(10)
    Outline of the review about liquid-assisted laser fabrication
    (a) Schematic diagram of liquid phase laser processing; (b) Generation, expansion, collapse, and persistent bubble generation based on cavitation bubbles generated by liquid phase laser ablation [11]; (c) Preparation of tail concentric circle macrostructure based on underwater sustained bubble-assisted femtosecond laser ablation technology[18]; (d) Preparation of porous crack structure based on femtosecond laser impact shot peening liquid ablation technology with different angles and morphology display[19]
    (a) Schematic diagram of laser induced back wet etching optical path system based on femtosecond laser[24] ; (b) Comparison of the morphologies of the holes prepared by laser-induced wet back etching under different environments[25]; (c) Shadow diagram of the hydrodynamics of cavitation bubbles produced by laser-induced wet back etching[26]
    (a) Flow chart of selective etching using the reaction rates of the auxiliary liquid and the material body and modified area[34]; (b) Flow chart for selective etching using an auxiliary liquid reacting only with the modified region[35]
    (a) Three different micro-nano structures are generated on the silicon surface[55]; (b) Microchannel structures are prepared by internal waves in photosensitive glass[88]; (c) Triangular pits prepared by anisotropic etching on the sapphire surface[89]
    (a) A single microlens with arbitrary morphology was prepared on the sapphire surface[90]; (b) Preparation of low-light level vortex generators with different morphologies on the diamond surface[91]; (c) The bionic moth-eye anti-reflection structure was prepared uniformly on the surface of the coated sapphire[92]; (d) Highly homogenous artificial compound eye structures prepared on the surface of sulfide[35]
    (a) Three-layer multi-branch microfluidic system[94]; (b) Auxiliary microchannel system with rotating impeller[94]; (c) A nested system structure of microcavities and microspheres that can control the direction of liquid flow[95]
    (a) Through hole array prepared by laser-induced micro-jet assisted ablation[19]; (b) Non-taper pores with different morphologies[98]; (c) Microchannel array prepared by laser-induced microjet assisted ablation[19]
    • Table 1. Comparison of advantages and disadvantages of three technologies

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      Table 1. Comparison of advantages and disadvantages of three technologies

      液体激光烧蚀激光诱导背面湿法刻蚀湿法腐蚀辅助激光改性
      优点1、阻隔加工过程中空气对材料的影响,尤其是避免对金属的氧化;2、液体起到冷却作用,减少热影响区; 3、液体的流动有效减少碎屑堆积,减少沉积层和重铸层的产生,提高表面质量。1、易于去除产生的碎屑,加工过程不受碎屑影响;2、流体同样起着冷却的作用,可以提高加工质量; 3、加工质量和精度较高,损伤较小。1、容易进行三维加工;2、加工能量低,易提高加工精度; 3、分布进行,加工过程不受液体的影响。
      不足1、激光穿过辅助液体,增加了激光能量损耗,包括液体中的光吸收和散射等;2、加工过程中液体的扰动对聚焦光束产生影响,导致光束质量下降,结构表面质量较差。1、吸收液一般是丙酮、甲苯、芘等有毒物质,具有环境和安全问题;2、难以制备复杂的三维结构。1、对于各向同性腐蚀,难以制备棱角分明的结构;2、难以对化学稳定性良好或耐腐蚀材料进行刻蚀。
    • Table 2. Different materials assist in liquid processing

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      Table 2. Different materials assist in liquid processing

      材料辅助液体加工方法激光器类型(波长/nm,脉冲宽度)制备结构时间引用
      光敏玻璃10%HF退火+湿法腐蚀fs激光器(775,150 fs)三维垂直微流控结构2004[44]
      光敏玻璃10%HF湿法腐蚀fs激光器(515,260 fs)微透镜2022[45]
      光敏玻璃10%HF湿法腐蚀fs激光器芯片内三维结构2011[46]
      光敏玻璃化学电镀液FS激光直接烧蚀+化学电镀fs激光器(1045,457 fs)微电器件2013[47]
      光敏玻璃和SU-810%HF湿法腐蚀+双光子聚合fs激光器(1045,360 fs)三维微流控结构2014[48]
      二氧化硅10%HF湿法腐蚀罗氏线圈电流换能器2016[49]
      二氧化硅高锰酸钾背部湿法刻蚀fs激光器(515,500 fs)LIPSS2018[50]
      二氧化硅磷酸/硫酸铜背部湿法刻蚀掺镱光纤激光器(1064,100 ns)高纵深比通道2020[51]
      二氧化硅HF湿法腐蚀fs激光器(800,50 fs)三维螺线管微线圈2014[41]
      5%HF两步湿法腐蚀fs激光器(800,35 fs)深纳米光栅2022[52]
      KOH(20wt%): 异丙醇=4:1湿法腐蚀fs激光器(800,35 fs)纳米间隙结构2021[53]
      5%HF湿法腐蚀+聚合物转写fs激光器(800,30 fs)微透镜阵列模板2012[54]
      氢氧化钾(20%):异丙醇(IPA,4%)=4:1湿法腐蚀fs激光器(800,35 fs)大面积微纳米结构2017[55]
      40%KOH背部湿法刻蚀fs激光器(1552.5,900 fs)深凹槽2022[33]
      40%KOH背部湿法刻蚀fs激光器(1552.5,900 fs)LIPSS2020[56]
      液体辅助激光加工fs激光器(790,30 fs)LIPSS2014[12]
      ----液体辅助激光加工--LIPSS[57-60]
      UPB-fs-LALfs激光器(1030,223 fs)尾部同心圆结构2020[21]
      fs-LSPALfs激光器(1030,223 fs)裂纹结构2020[22]
      水,乙醇背部湿法刻蚀fs激光器(800,120 fs)2019[25]
      饱和芘/丙酮背部湿法刻蚀KrF准分子激光器(248,20 ns)倾斜微沟槽2010[61]
      水/乙醇液体辅助激光加工Yb: KGW飞秒激光器(515,217 fs)切割硅晶片2022[11]
      20%HF湿法腐蚀fs激光器(800,50 fs)孔阵列2015[39]
      熔融石英10%HF湿法腐蚀fs激光器谐振器2022[62]
      熔融石英10 mol/L的KOH湿法腐蚀fs激光器微轴棱锥2022[63]
      熔融石英5%HF湿法腐蚀fs激光器(800,120 fs)大面积微透镜阵列2018[64]
      熔融石英5%HF湿法腐蚀fs激光器(1030,230 fs)凹槽2019[65]
      熔融石英KOH湿法腐蚀fs激光器芯片内三维结构2011[46]
      熔融石英0.5 mol的芘/甲苯和甲苯背部湿法刻蚀ps激光器(355,10 ps) ps激光器(266,10 ps)LIPSS2010[66]
      熔融石英0.5 mol芘/甲苯ns背部刻蚀+fs烧蚀fs激光器(248,500 ps) Ti:蓝宝石激光器(775,130 fs)LIPSS2006[67]
      熔融石英丙酮/芘背部湿法刻蚀XeCl准分子激光器(308,30 ns)微透镜阵列2004[26]
      蓝宝石H3PO4: H2SO4=1:3湿法腐蚀+掩膜压力传感器2021[68]
      蓝宝石H3PO4: H2SO4=1:3湿法腐蚀fs激光器(1028,190 fs)微透镜阵列2018[38]
      蓝宝石H3PO4: H2SO4=1:3湿法腐蚀fs激光器(800,120 fs)SWS减反结构2017[69]
      蓝宝石5%HF湿法腐蚀fs激光器无锥度通孔2022[61]
      蓝宝石40%KOH湿法腐蚀fs激光器(800,120 fs)大面积微透镜阵列2018[64]
      蓝宝石氯苯背部湿法刻蚀ps激光器(266,150 ps)光栅2007[70]
      蓝宝石甲苯背部湿法刻蚀ps激光器(355,10 ps)凹槽2010[71]
      蓝宝石硫酸铜背部湿法刻蚀Nd:YAG激光器(1064,120 ns)凹槽2017[31]
      4H-SiC正丁醇溶液背部湿法刻蚀-微射流fs激光器(520,300 fs)孔和凹槽2022[19]
      硒化锌ZnSeH2O2(26%): NH4OH(28%)=1:3湿法腐蚀fs激光器(800,130 fs)脊形波导2022[72]
      硼硅酸盐玻璃8.5 mol/L的KOH湿法腐蚀三维自由形状2021[73]
      氟化物甲苯背部湿法刻蚀ps激光器(355,10 ps)凹槽2010[71]
      钠钙玻璃硫酸铜背部湿法刻蚀+液相沉积掺镱光纤激光器(1064,100 ps)微铜图案2020[74]
      锗晶片水/乙醇液体辅助激光加工Nd: YAG激光器(1064,10 ps)切割锗晶片2016[75]
      K9玻璃8%HF湿法腐蚀+转写硫族玻璃fs激光器(800,50 fs)复眼2022[35]
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    Meiling Luan, Jiaxin Zheng, Xiangchao Sun, Xueqing Liu. Liquid-assisted laser fabrication of hard materials and applications[J]. Opto-Electronic Engineering, 2023, 50(3): 220328

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    Paper Information

    Category: Article

    Received: Dec. 5, 2022

    Accepted: Feb. 10, 2023

    Published Online: May. 4, 2023

    The Author Email:

    DOI:10.12086/oee.2023.220328

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