Fig. 1. Production process of thermal cathode preparation.热阴极制备工艺流程图

Fig. 2. Surface microtopography of cathode with periodic stripe structure: (a) Unidirectionalstripe structure; (b) orthogonal bidirectional stripe structure.周期性条纹结构阴极的表面显微形貌　(a)单向条纹结构; (b)正交双向条纹结构

Fig. 3. Diagram of water-cooled vacuum diode and cathode performance testing system. Symbol 1, 2, 3 and 4 are cathode, glass shell, anode and cooling water connector, respectively.水冷真空二极管结构及阴极性能测试系统示意图(1为阴极, 2为玻壳, 3为阳极, 4为冷却水接口)

Fig. 4. Current density character of cathode sample 1 and 2 with different working temperature.不同工作温度条件下阴极样品1和样品2发射电流密度特性

Fig. 5. Current density character of cathode sample 3 and 4 with different working temperature.不同工作温度条件下阴极样品3和样品4的发射电流密度特性

Fig. 6. Current density character of cathode sample 4 with polar distance 0.1 mm.极间距为0.1 mm时阴极样品4的发射电流密度特性

Fig. 7. Current density character of cathode sample 5 and 6 with different working temperature.不同工作温度条件下阴极样品5和样品6发射电流密度特性

Fig. 8. Emulation model of electron emission performance of cathode with array 3 × 3.3 × 3阵列结构的阴极电子发射性能仿真模型

Fig. 9. Spatial distribution of electrons of longitudinal sections of cathode with array 3 × 3: (a) Cross section of top of tip; (b) cross section of clearance of tips.3 × 3阵列结构的阴极纵向截面处电子的空间分布　(a)微尖尖端位置截面; (b)微尖间隙位置截面

Fig. 10. Electronic distribution of lateral interface that far from the cathode surface about 距阴极表面微尖顶端 位置处横向截面中的电子分布

Fig. 11. Ideal structural model of cathode surface with array 4 × 4.4 × 4阵列结构阴极表面理想结构模型

Fig. 12. Potential distribution of cathode at the tapered micro-tip array structure.锥形微尖阵列结构中阴极电势分布

Fig. 13. Effect of r/h value of micro-tip structure on emission current density of cathode. 微尖结构r/h值对阴极发射电流密度的影响