International Journal of Extreme Manufacturing, Volume. 4, Issue 3, 35201(2022)

Robust and high-sensitivity thermal probing at the nanoscale based on resonance Raman ratio (R3)

Hamidreza Zobeiri1... Nicholas Hunter1, Shen Xu2,*, Yangsu Xie3 and Xinwei Wang1 |Show fewer author(s)
Author Affiliations
  • 1Department of Mechanical Engineering, Iowa State University, Ames, IA 50011, United States of America
  • 2School of Mechanical and Automotive Engineering, Shanghai University of Engineering Science, 333 Longteng Road, Shanghai 201620, People’s Republic of China
  • 3College of Chemistry and Environmental Engineering, Shenzhen University, Shenzhen, Guangdong 518055, People’s Republic of China
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    Hamidreza Zobeiri, Nicholas Hunter, Shen Xu, Yangsu Xie, Xinwei Wang. Robust and high-sensitivity thermal probing at the nanoscale based on resonance Raman ratio (R3)[J]. International Journal of Extreme Manufacturing, 2022, 4(3): 35201

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    Paper Information

    Received: Nov. 26, 2021

    Accepted: --

    Published Online: Jan. 23, 2023

    The Author Email: Shen Xu (shxu16@sues.edu.cn)

    DOI:10.1088/2631-7990/ac6cb1

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