Chinese Optics Letters, Volume. 11, Issue s1, S10205(2013)

Anti-reflection coating at 550 nm fabricated by atomic layer deposition

Yanghui Li, Weidong Shen, Yueguang Zhang, Xiang Hao, Huanhuan Fan, and Xu Liu
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Yanghui Li, Weidong Shen, Yueguang Zhang, Xiang Hao, Huanhuan Fan, Xu Liu. Anti-reflection coating at 550 nm fabricated by atomic layer deposition[J]. Chinese Optics Letters, 2013, 11(s1): S10205

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Paper Information

Category: Deposition and process control

Received: Dec. 12, 2012

Accepted: Dec. 27, 2012

Published Online: May. 30, 2013

The Author Email:

DOI:10.3788/col201311.s10205

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