Laser & Optoelectronics Progress, Volume. 52, Issue 3, 31403(2015)

Fabrication Process Study of Silicon Nitride Passivation Layer on GaAs Substrate at Low Temperature

Wu Tao* and Jiang Xianfeng
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    Wu Tao, Jiang Xianfeng. Fabrication Process Study of Silicon Nitride Passivation Layer on GaAs Substrate at Low Temperature[J]. Laser & Optoelectronics Progress, 2015, 52(3): 31403

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    Paper Information

    Category: Lasers and Laser Optics

    Received: Sep. 9, 2014

    Accepted: --

    Published Online: Feb. 5, 2015

    The Author Email: Tao Wu (wut@sibet.ac.cn)

    DOI:10.3788/lop52.031403

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