Electro-Optic Technology Application, Volume. 25, Issue 3, 53(2010)
Research on Illumination Measuring System for Mask Projection Stereolithography
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TAN Dong-cai, XU Guang-shen, LUO Sheng, JIN Jing. Research on Illumination Measuring System for Mask Projection Stereolithography[J]. Electro-Optic Technology Application, 2010, 25(3): 53
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Received: May. 10, 2010
Accepted: --
Published Online: Aug. 3, 2010
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CSTR:32186.14.