High-Order Aberration Measurement Technique for Immersion Lithography Projection Lens Based on Multi-Polarized illuminations

Boer Zhu; Sikun Li; Xiangzhao Wang; Fengzhao Dai; Feng Tang; Lifeng Duan

doi:10.3788/AOS201838.0712004

Acta Optica Sinica, Volume. 38, Issue 7, 0712004(2018)

High-Order Aberration Measurement Technique for Immersion Lithography Projection Lens Based on Multi-Polarized illuminations

Boer Zhu^1,2, Sikun Li^1,2、*, Xiangzhao Wang^1,2, Fengzhao Dai^1,2, Feng Tang^1,2, and Lifeng Duan³

Author Affiliations

¹ Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

² University of Chinese Academy of Sciences, Beijing 100049, China

³ Shanghai Micro Electronics Equipment (Group) Co., Ltd., Shanghai 201203, China

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Boer Zhu, Sikun Li, Xiangzhao Wang, Fengzhao Dai, Feng Tang, Lifeng Duan. High-Order Aberration Measurement Technique for Immersion Lithography Projection Lens Based on Multi-Polarized illuminations[J]. Acta Optica Sinica, 2018, 38(7): 0712004

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Paper Information

Category: Instrumentation, Measurement and Metrology

Received: Jan. 24, 2018

Accepted: --

Published Online: Sep. 5, 2018

The Author Email: Li Sikun (lisikun@siom.ac.cn)

DOI:10.3788/AOS201838.0712004

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology