Preparation of Anti-Reflection Coatings on Quartz Tube Surfaces Based on Atomic Layer Deposition

Wen Mu; Weidong Shen; Chenying Yang; Xiaowen Zheng; Zhen Wang; Huaxin Yuan; Wenjia Yuan; Yueguang Zhang

doi:10.3788/AOS201939.0324001

Acta Optica Sinica, Volume. 39, Issue 3, 0324001(2019)

Preparation of Anti-Reflection Coatings on Quartz Tube Surfaces Based on Atomic Layer Deposition

Wen Mu, Weidong Shen^*, Chenying Yang, Xiaowen Zheng, Zhen Wang, Huaxin Yuan, Wenjia Yuan, and Yueguang Zhang

State Key Laboratory of Modern Optical Instrumentation, College of Optical Science and Engineering, Zhejiang University, Hangzhou, Zhejiang 310027, China

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Figures & Tables(13)

Fig. 1. Schematic of quartz tube holder and various testing points on quartz tube. (a) Quartz tube holder; (b) testing points

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Fig. 2. Thickness uniformity distribution of single layer. (a) Al2O3 film; (b) TiO2 film

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$Refractive index and extinction coefficient of materials. (a) Refractive index of Al2O3; (b) refractive index and extinction coefficient of TiO2$

Fig. 3. Refractive index and extinction coefficient of materials. (a) Refractive index of Al2O3; (b) refractive index and extinction coefficient of TiO2

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Fig. 4. Experimental and simulated reflectivities of single wavelength 550 nm AR coating

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Fig. 5. Central wavelength deviations on outer surfaces of quartz tubes with different outer diameters. (a) Circumferential direction of outer surface; (b) axial direction of outer surface

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Fig. 6. Central wavelength deviations on inner surfaces of quartz tubes with different inner diameters. (a) Circumferential direction of inner surface; (b) axial direction of inner surface

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Fig. 7. Axial central wavelength deviations on inner and outer surfaces of quartz tubes with different lengths. (a) Axial direction of inner surface; (b) axial direction of outer surface

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Fig. 8. Central wavelength distributions of quartz tube with outer diameter of 40 mm, inner diameter of 37 mm, and length of 50 mm. (a) Outer surface; (b) inner surface

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Table 1. Process parameters for preparation of Al2O3 and TiO2 based on ALD technology

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Table 1. Process parameters for preparation of Al2O3 and TiO2 based on ALD technology

Material	Substrate temperature /℃	First reactant(pulse time)	Purge gas(purge time)	Second reactant (pulse time)	Purge gas(purge time)
TiO₂	120	TiCl₄(0.35 s)	N₂(6 s)	H₂O(0.3 s)	N₂(8 s)
Al₂O₃	120	TMA(0.50 s)	N₂(6 s)	H₂O(0.3 s)	N₂(8 s)

Table 2. Quartz tube size
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Table 2. Quartz tube size
Experimental group Outer diameter/mm Inner diameter/mm Length/mm
23 20 20
1 26 20 20
30 20 20
40 37 20
2 40 34 20
40 30 20
40 34 30
3 40 34 40
40 34 50

Table 3. Non-uniformity on outer surfaces of quartz tubes with different outer diameters

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Table 3. Non-uniformity on outer surfaces of quartz tubes with different outer diameters

Outer diameter /mm	Circumferential non-uniformity /%	Axial non-uniformity /%	Total non-uniformity /%	Total non-uniformity except ±150° /%	Total averagecenter wavelength /nm
23	1.00	0.27	1.97	1.69	547
26	1.13	0.50	1.73	1.04	549
30	1.18	0.36	1.91	1.50	549

Table 4. Non-uniformity on inner surfaces of quartz tubes with different inner diameters
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Table 4. Non-uniformity on inner surfaces of quartz tubes with different inner diameters
Inner diameter /mm Circumferential non-uniformity /% Axial non-uniformity /% Total non-uniformity /% Total averagecenter wavelength /nm
37 0.68 0.68 1.59 551
34 0.36 0.72 1.49 552
30 0.49 0.59 1.26 553

Table 5. Uniformity of inner and outer surfaces of quartz tubes with different lengths

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Table 5. Uniformity of inner and outer surfaces of quartz tubes with different lengths

Position	Length /mm	Circumferential non-uniformity /%	Axial non-uniformity /%	Total non-uniformity /%	Total averagecenter wavelength /nm
	30	0.78	0.78	1.10	543
Inner surface	40	0.37	0.83	1.48	542
	50	0.50	0.64	1.42	544
	30	0.83	0.64	1.29	544
Outer surface	40	0.46	0.27	1.47	546
	50	0.69	0.60	1.65	544

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Wen Mu, Weidong Shen, Chenying Yang, Xiaowen Zheng, Zhen Wang, Huaxin Yuan, Wenjia Yuan, Yueguang Zhang. Preparation of Anti-Reflection Coatings on Quartz Tube Surfaces Based on Atomic Layer Deposition[J]. Acta Optica Sinica, 2019, 39(3): 0324001

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Paper Information

Category: Optics at Surfaces

Received: Sep. 25, 2018

Accepted: Oct. 30, 2018

Published Online: May. 10, 2019

The Author Email:

DOI:10.3788/AOS201939.0324001

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology

Table 1. Process parameters for preparation of Al2O3 and TiO2 based on ALD technology

Table 1. Process parameters for preparation of Al2O3 and TiO2 based on ALD technology

Table 2. Quartz tube size

Table 2. Quartz tube size

Table 3. Non-uniformity on outer surfaces of quartz tubes with different outer diameters

Table 3. Non-uniformity on outer surfaces of quartz tubes with different outer diameters

Table 4. Non-uniformity on inner surfaces of quartz tubes with different inner diameters

Table 4. Non-uniformity on inner surfaces of quartz tubes with different inner diameters

Table 5. Uniformity of inner and outer surfaces of quartz tubes with different lengths

Table 5. Uniformity of inner and outer surfaces of quartz tubes with different lengths