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Optics and Precision Engineering, Volume. 21, Issue 6, 1434(2013)

Clearing residual resist in nanoimprint lithography by multi-mask

CHEN Xin1,*... ZHAO Jian-yi1, WANG Zhi-hao1, WANG Lei2, ZHOU Ning3, and LIU Wen12 |Show fewer author(s)
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  • 3[in Chinese]
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    CHEN Xin, ZHAO Jian-yi, WANG Zhi-hao, WANG Lei, ZHOU Ning, LIU Wen. Clearing residual resist in nanoimprint lithography by multi-mask[J]. Optics and Precision Engineering, 2013, 21(6): 1434

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    Received: Jan. 17, 2013

    Accepted: --

    Published Online: Jul. 1, 2013

    The Author Email: Xin CHEN (chenxin3358@163.com)

    DOI:10.3788/ope.20132106.1434

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology