Laser & Optoelectronics Progress, Volume. 56, Issue 14, 141602(2019)
Properties of Sol-Gel-Modified SiO2 Antireflective Films by Spin Coating
Figures & Tables(9)
Fig. 1. Particle distribution of SiO2 coating solutions before and after filtration
Fig. 3. Surface of substrate after hand cleaning. (a) Enlarged by 50 times; (b) enlarged by 200 times
Fig. 4. Surface of substrate after ultrasonic cleaning. (a) Enlarged by 50 times; (b) enlarged by 200 times
Fig. 5. Films on small size square KDP crystals by single spin coating method. (a) 3ω; (b) 1ω/2ω
Table 1. Water contact angles of substrates with different cleaning methods
View tableTable 1. Water contact angles of substrates with different cleaning methods
Cleaning methods Contact angle 1 Contact angle 2 Contact angle 3 Contact angle 4 Hand cleaning /(°) 62.1 59.3 66.1 63.0 Ultrasonic cleaning /(°) 38.7 37.9 37.7 35.1
Table 2. Transmittance peak wavelengths of small size square crystals coated film
View tableTable 2. Transmittance peak wavelengths of small size square crystals coated film
Area After coating 3 ω antireflection filmAfter coating 1 ω /2ω antireflection filmPeak transmittance /% Peak wavelength /nm Peak transmittance /% Peak wavelength /nm 1 >99.6 343-355 >99.9 689-702 2 >99.7 338-353 >99.8 694-702 3 >99.7 338-349 >99.8 709-720 4 >99.5 348-359 >99.9 694-702 5 >99.6 347-360 >99.9 710-720
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Bin Shen, Haiyuan Li, Xu Zhang. Properties of Sol-Gel-Modified SiO2 Antireflective Films by Spin Coating[J]. Laser & Optoelectronics Progress, 2019, 56(14): 141602
Paper Information
Category: Materials
Received: Jan. 23, 2019
Accepted: Feb. 21, 2019
Published Online: Jul. 12, 2019
The Author Email: Shen Bin (bingo2011@siom.ac.cn)
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