Semiconductor Optoelectronics, Volume. 45, Issue 3, 378(2024)

Structure Design and Characteristics Research of 1000 V 4H-SiC VDMOS

LIYao... NIU Ruixia, WANG Ailing, WANG Fenqiang, LAN Jun, ZHANG Xuying, ZHANG Pengjie, LIU Liangpeng and WU Huizhou |Show fewer author(s)
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    References(12)

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    [10] [10] LiQ ,Bao T ,Li H ,et al. Uniform shallow trenches termination design for high-voltage VDMOS transistor[J] . Electron. Lett. ,2020 ,56(2) : 104-105.

    [11] [11] Schlichting H ,Sledziewski T ,Bauer A ,et al. Design considerations for robust manufacturing and high yield of 1. 2 kV 4H-4H-SiC VDMOS transistors[J] . Mater. Sci. Forum ,2019 ,963: 763-767.

    [14] [14] HanK ,Baliga B J ,Sung W. Split-gate 1. 2-kV 4H-4H-SiC MOSFET: Analysis and experimental validation[J] . IEEE Electron Device Lett. ,2017 ,38(10) : 1437-1440.

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    LIYao, NIU Ruixia, WANG Ailing, WANG Fenqiang, LAN Jun, ZHANG Xuying, ZHANG Pengjie, LIU Liangpeng, WU Huizhou. Structure Design and Characteristics Research of 1000 V 4H-SiC VDMOS[J]. Semiconductor Optoelectronics, 2024, 45(3): 378

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    Paper Information

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    Received: Jan. 17, 2024

    Accepted: --

    Published Online: Oct. 15, 2024

    The Author Email:

    DOI:10.16818/j.issn1001-5868.2024011701

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