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Chinese Journal of Lasers, Volume. 35, Issue 12, 2026(2008)

Design, Preparation and Characterization of 355 nm Antireflection Coatings

Yu Hua1,2、*, Cui Yun1,2, Shen Yanming1,2, Qi Hongji1, Yi Kui1, Shao Jianda1, and Fan Zhengxiu1
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    Yu Hua, Cui Yun, Shen Yanming, Qi Hongji, Yi Kui, Shao Jianda, Fan Zhengxiu. Design, Preparation and Characterization of 355 nm Antireflection Coatings[J]. Chinese Journal of Lasers, 2008, 35(12): 2026

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    Paper Information

    Category: materials and thin films

    Received: Jan. 8, 2008

    Accepted: --

    Published Online: Dec. 17, 2008

    The Author Email: Hua Yu (yuhua5101@163.com)

    DOI:

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology