Metasurface-based subtractive color filter fabricated on a 12-inch glass wafer using a CMOS platform

Zhengji Xu; Nanxi Li; Yuan Dong; Yuan Hsing Fu; Ting Hu; Qize Zhong; Yanyan Zhou; Dongdong Li; Shiyang Zhu; Navab Singh

doi:10.1364/PRJ.404124

Photonics Research, Volume. 9, Issue 1, 13(2021)

Metasurface-based subtractive color filter fabricated on a 12-inch glass wafer using a CMOS platform On the Cover

Zhengji Xu^1,2, Nanxi Li^1、*, Yuan Dong¹, Yuan Hsing Fu¹, Ting Hu¹, Qize Zhong¹, Yanyan Zhou¹, Dongdong Li¹, Shiyang Zhu¹, and Navab Singh¹

Author Affiliations

¹Institute of Microelectronics, A*STAR (Agency for Science, Technology and Research), Singapore 138634, Singapore

²Current Address: School of Microelectronics Science and Technology, Sun Yat-sen University, Zhuhai 519082, China

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Zhengji Xu, Nanxi Li, Yuan Dong, Yuan Hsing Fu, Ting Hu, Qize Zhong, Yanyan Zhou, Dongdong Li, Shiyang Zhu, Navab Singh. Metasurface-based subtractive color filter fabricated on a 12-inch glass wafer using a CMOS platform[J]. Photonics Research, 2021, 9(1): 13

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Paper Information

Category: Integrated Optics

Received: Jul. 31, 2020

Accepted: Sep. 27, 2020

Published Online: Dec. 15, 2020

The Author Email: Nanxi Li (linx1@ime.a-star.edu.sg)

DOI:10.1364/PRJ.404124

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology