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Laser & Optoelectronics Progress, Volume. 60, Issue 1, 0122002(2023)

Split-Delay Optical System for Hard X-Ray Free-Electron Lasers

Chen Wu1,2, Zhiyuan Zhang2, Yihui Xu3, Li Song4, Xiaohao Dong2,4、*, and Zhi Liu1,3
Author Affiliations
  • 1School of Physical Science and Technology, ShanghaiTech University, Shanghai 201210, China
  • 2Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China
  • 3Center for Transformative Science, ShanghaiTech University, Shanghai 201210, China
  • 4Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai 201210, China
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    AbstractGet PDF(in Chinese)
    Figures&Tables (8)
    Equations (7)
    References (28)
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    Figures & Tables(8)
    Schematic of split-delay optical system

    Fig. 1. Schematic of split-delay optical system

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    Schematic of splitting. (a) Wavefront splitting; (b) intensity splitting based on Bragg crystals

    Fig. 2. Schematic of splitting. (a) Wavefront splitting; (b) intensity splitting based on Bragg crystals

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    Schematic of crystal layout of split-delay optical system

    Fig. 3. Schematic of crystal layout of split-delay optical system

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    Simulation of beam profile. (a) Beam after DCM; (b) upper beam; (c) lower beam; (d) merged beam

    Fig. 4. Simulation of beam profile. (a) Beam after DCM; (b) upper beam; (c) lower beam; (d) merged beam

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    Splitting and alignment of lower-brunch

    Fig. 5. Splitting and alignment of lower-brunch

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    Alignment of upper-brunch

    Fig. 6. Alignment of upper-brunch

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    • Table 1. Calculation results of split-delay optical system at different situations

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      Table 1. Calculation results of split-delay optical system at different situations

      Photon energy E /keVWith channel-cutWithout channel-cut
      Minimum delay τmin /psMaximum delay τmax /psMinimum delay τmin /psMaximum delay τmax /ps
      7-15.4320.1167.8503.3
      8-31.8225.1128.4385.3
      9-41.0162.0101.5304.5
      10-46.0118.482.2246.6
      11-15.4320.1167.8503.3

    • Table 2. Simulation results of throughput with 8 keV

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      Table 2. Simulation results of throughput with 8 keV

      Source ΔE/ECrystal configurationThroughput of upper beam Tup /%Throughput of lower beam Tlow /%
      BS/BMBRCC
      Si（111）1.4×10-4Si（220）Si（220）—33.5450.00
      Si（220）Si（220）Si（220）33.5433.64
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    Chen Wu, Zhiyuan Zhang, Yihui Xu, Li Song, Xiaohao Dong, Zhi Liu. Split-Delay Optical System for Hard X-Ray Free-Electron Lasers[J]. Laser & Optoelectronics Progress, 2023, 60(1): 0122002

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Feb. 7, 2022

    Accepted: Mar. 24, 2022

    Published Online: Dec. 9, 2022

    The Author Email: Dong Xiaohao (dongxiaohao@zjlab.org.cn)

    DOI:10.3788/LOP220917

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology