Optics and Precision Engineering, Volume. 13, Issue 3, 272(2005)

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    References(6)

    [2] [2] BJORN A M. HANSSON M B,OSCAR H G,et al. Xenon liquid jet laser-plasma source for EUV lithography[J]. SPIE, 2000, 3997:729-732.

    [3] [3] MOCHIZUKI T, SHIMOURA A, AMANO S, et al. Compact high-average-power laser-plasma X-ray source by cryogenic targets[J]. SPIE, 2001,4504:87-96.

    [4] [4] LIN J Q,YASHIRO H,AOTA T,et al. EUV generation using water droplet target[J]. SPIE,2004,5374: 906-911.

    [5] [5] VOGT U,STIEL H,WILL I. Scaling-up a liquid water jet laser plasma source to high average power for extreme ultraviolet lithography[J]. SPIE, 2001,4343:87-93.

    [8] [8] JIN F, RICHARDSON M. New laser plasma source for extreme-ultraviolet lithography[J].Appl. Opt., 1995,34(25) :5750-5760.

    [9] [9] JIN F,RICHARDSON M,SHIMKAVEG G,et al. Characterization of a laser plasma water droplet EUV source[J]. SPIE, 1995,2523:81-87.

    CLP Journals

    [1] WANG Rui-rong, CHEN Wei-min. Unfolded study on spectra by elliptical crystal spectrometer[J]. Optics and Precision Engineering, 2009, 17(2): 274

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    Paper Information

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    Received: Feb. 22, 2005

    Accepted: --

    Published Online: Nov. 3, 2006

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