Stress Birefringence Analysis in Fused Silica at Deep Ultraviolet Waveband Based on Finite Element Simulation Method

Zhifan Liu; Yanmin Cai; Yang Bu; Jianhua Zhang; Xiangzhao Wang

doi:10.3788/AOS202141.1226001

Acta Optica Sinica, Volume. 41, Issue 12, 1226001(2021)

Stress Birefringence Analysis in Fused Silica at Deep Ultraviolet Waveband Based on Finite Element Simulation Method

Zhifan Liu¹, Yanmin Cai², Yang Bu^2、*, Jianhua Zhang¹, and Xiangzhao Wang²

Author Affiliations

¹School of Mechatronic Engineering and Automation, Shanghai University, Shanghai 200444, China

²Laboratory of Information Optics and Optoelectronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

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Zhifan Liu, Yanmin Cai, Yang Bu, Jianhua Zhang, Xiangzhao Wang. Stress Birefringence Analysis in Fused Silica at Deep Ultraviolet Waveband Based on Finite Element Simulation Method[J]. Acta Optica Sinica, 2021, 41(12): 1226001

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Paper Information

Category: Physical Optics

Received: Nov. 12, 2020

Accepted: Feb. 1, 2021

Published Online: Jun. 2, 2021

The Author Email: Bu Yang (buyang@siom.ac.cn)

DOI:10.3788/AOS202141.1226001

Topics

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